Consulting photolithography
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We support you in solving lithographic problems
Surface tension, adhesion and wetting of materials for photolithographic process
Surface Tension and Adhesion of Photo and Electron-Beam Resists
Optimization of anti-reflective coatings for lithography applications:
Optical Proximity Correction for 0.13µm SiGe:C BiCMOS:
100nm Half-Pitch Double Exposure KrF Lithography Using Binary Masks:
Deep-UV KrF Lithography for the Fabrication of Bragg Gratings on SOI Rib Waveguides:
Alignment Technology for Backside Integration:
Lithographic aspects for the fabrication of BiCMOS embedded Bio-MEMS and RF-MEMS: